Description
This sputtering target is designed for use with sputter coaters, featuring a Gold-Palladium alloy composition. It is precisely manufactured to ensure consistent and reliable performance in electron microscopy applications. The target’s dimensions and material composition are optimized for efficient sputtering processes, contributing to high-quality sample preparation.
- Gold-Palladium (60:40) alloy composition
- Designed for sputter coater cathodes
- Ensures consistent sputtering performance
Equip your lab with this essential sputtering target for superior results.
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