91015-CU Electron Microscopy Sciences Sputtering Target Copper, 50.8 mm Dia

Description

This copper sputtering target from Electron Microscopy Sciences is designed for use in sputter coaters. It features a precise diameter of 50.8 mm, ensuring compatibility with standard equipment. Manufactured to high standards, this target provides reliable performance for critical applications in electron microscopy and material science. Its composition is optimized for consistent film deposition.

• High-purity copper composition
• Precisely manufactured for consistent results
• Designed for use in sputter coating applications

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