Description
This sputtering target is specifically designed for use in sputter coaters and related equipment. It is constructed from high-quality Tantalum, ensuring reliable performance in electron microscopy applications. The target features a precise 32mm diameter, making it compatible with standard sputter coater systems. Its robust construction and material properties contribute to consistent and uniform film deposition.
- High-purity Tantalum material
- 32mm diameter for broad compatibility
- Designed for sputter coating applications
Invest in the quality and precision of Electron Microscopy Sciences products for your laboratory needs.
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