80929-CM Electron Microscopy Sciences EMS CeBix 90/20 Non-shunted Cathode

Description

This Electron Microscopy Sciences cathode, identified by MPN 80929-CM, is designed for Leica Lithography applications utilizing a Cambridge MVM base. It features a CeBix 90/20 configuration that is non-shunted, ensuring specific performance characteristics for electron beam lithography. This product is engineered to meet the demanding requirements of advanced microscopy and lithography processes.

• CeBix 90/20 configuration
• Non-shunted design
• Compatible with Cambridge MVM base
• Suitable for Leica Lithography

Explore the advanced capabilities of this specialized cathode for your critical applications.