1000 µg/mL Silicon from Silicon Dioxide in 1% HNO3 + Tr HF, 100mL

Description

1000 µg/mL Silicon from Silicon Dioxide in 1% HNO3 + Tr HF, 100mL (SKU: 100050-3-100)

This certified silicon standard solution is prepared from high-purity silicon dioxide dissolved in a matrix of 1% nitric acid with trace hydrofluoric acid, ensuring optimal stability and solubility. Ideal for ICP-OES, ICP-MS, and AAS calibration, this reference standard supports accurate silicon determination in environmental testing, semiconductor analysis, geological sample analysis, and quality control applications across various industries.

• Concentration: 1000 µg/mL (1000 ppm) Silicon
• Source Material: High-purity Silicon Dioxide (SiO₂)
• Matrix: 1% HNO₃ + Trace HF for enhanced silicon stability
• Volume: 100mL, supplied in HDPE bottle
• Applications: ICP-OES, ICP-MS, AAS calibration and method validation
• Traceability: Certified reference material with comprehensive Certificate of Analysis included